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Varela, L. B., Tavares Avila, P. R., Miletic, A., Bousser, E., Mendez, J. M., Sapieha, J.-E., & Martinu, L. (2024). Residual stress depth profiles self-developed in cathodic arc deposited Ti-Al-N coatings prepared at different constant substrate bias values. Journal of Vacuum Science & Technology A, 42(4), 043104 (22 pages). Lien externe
