In-situ monitoring of stress evolution in high power impulse magnetron sputtering-deposited Ti-Al-N films: Effect of substrate bias and temperature

P. R. T. Avila, O. Zabeida, L. B. Varela, Jolanta-Ewa Sapieha and Ludvik Martinu

Article (2023)

An external link is available for this item

Department:	Department of Engineering Physics
PolyPublie URL:	https://publications.polymtl.ca/56295/
Journal Title:	Thin Solid Films (vol. 784)
Publisher:	Elsevier B.V.
DOI:	10.1016/j.tsf.2023.140069
Official URL:	https://doi.org/10.1016/j.tsf.2023.140069
Date Deposited:	02 Nov 2023 15:35
Last Modified:	25 Sep 2024 16:47

Cite in APA 7:	Avila, P. R. T., Zabeida, O., Varela, L. B., Sapieha, J.-E., & Martinu, L. (2023). In-situ monitoring of stress evolution in high power impulse magnetron sputtering-deposited Ti-Al-N films: Effect of substrate bias and temperature. Thin Solid Films, 784, 140069 (13 pages). https://doi.org/10.1016/j.tsf.2023.140069
APA 7 (HTML)ASCII CitationAtomBibTeXDOIsDublin CoreEndNote (.ENW)MARC (ISO 2709/UTF-8) (.MRC)MARC (UTF-8) (.MRK8)MARC XMLMPEG-21 DIDLMultiline CSVOAI-ORE Resource Map (Atom Format)OPENAIREOpenURL ContextObjectOpenURL ContextObject in SpanRDF+N-TriplesRDF+N3RDF+XMLReferReference Manager (.RIS)Répertoire des publications (EndNote)Simple Metadata

Statistics

Dimensions

Repository Staff Only

View Item