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In-situ monitoring of stress evolution in high power impulse magnetron sputtering-deposited Ti-Al-N films: Effect of substrate bias and temperature

P. R. T. Avila, O. Zabeida, L. B. Varela, Jolanta-Ewa Sapieha and Ludvik Martinu

Article (2023)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/56295/
Journal Title: Thin Solid Films (vol. 784)
Publisher: Elsevier B.V.
DOI: 10.1016/j.tsf.2023.140069
Official URL: https://doi.org/10.1016/j.tsf.2023.140069
Date Deposited: 02 Nov 2023 15:35
Last Modified: 05 Apr 2024 12:03
Cite in APA 7: Avila, P. R. T., Zabeida, O., Varela, L. B., Sapieha, J.-E., & Martinu, L. (2023). In-situ monitoring of stress evolution in high power impulse magnetron sputtering-deposited Ti-Al-N films: Effect of substrate bias and temperature. Thin Solid Films, 784, 140069 (13 pages). https://doi.org/10.1016/j.tsf.2023.140069

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