In-situ monitoring of stress evolution in high power impulse magnetron sputtering-deposited Ti-Al-N films: Effect of substrate bias and temperature

Pedro Renato Tavares Ávila, O. Zabeida, Luis Bernardo Varela, Jolanta-Ewa Sapieha and Ludvik Martinu

Article (2023)

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Department:	Department of Engineering Physics
PolyPublie URL:	https://publications.polymtl.ca/56295/
Journal Title:	Thin Solid Films (vol. 784)
Publisher:	Elsevier B.V.
DOI:	10.1016/j.tsf.2023.140069
Official URL:	https://doi.org/10.1016/j.tsf.2023.140069
Date Deposited:	02 Nov 2023 15:35
Last Modified:	08 Apr 2025 07:25

Cite in APA 7:	Ávila, P. R. T., Zabeida, O., Varela, L. B., Sapieha, J.-E., & Martinu, L. (2023). In-situ monitoring of stress evolution in high power impulse magnetron sputtering-deposited Ti-Al-N films: Effect of substrate bias and temperature. Thin Solid Films, 784, 140069 (13 pages). https://doi.org/10.1016/j.tsf.2023.140069
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