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Growth mechanisms of sulfur-rich plasma polymers: Binary gas mixtures versus single precursor

Evelyne Kasparek, Damien Thiry, Jason Robert Tavares, Michael R. Wertheimer, Rony Snyders and Pierre-Luc Girard-Lauriault

Article (2018)

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Thiol (SH)‐terminated surfaces have gained interest over the past years due to their potential applications, especially in the biomedical field. In this work, SH‐terminated films have been prepared by “co‐polymerizing” gas mixtures of acetylene (C2H2) and hydrogen sulfide (H2S) using low‐pressure r.f. plasma‐enhanced chemical vapor deposition. R.f. power greatly influences the deposition rate, sulfur content, [S], and thiol concentration, [SH], of the films, as confirmed by XPS (both before and after chemical derivatization), FTIR, and mass spectrometry measurements. These data are compared with those obtained in a similar discharge by using a single molecule precursor, propanethiol. Among other differences, it is demonstrated that [SH] is higher when using binary gas mixtures compared to the single molecule precursor.

Uncontrolled Keywords

Mass spectrometry, plasma polymerization, stability, sulfur-rich organic films, thiol derivatization

Subjects: 1800 Chemical engineering > 1800 Chemical engineering
3100 Physics > 3100 Physics
Department: Department of Chemical Engineering
Department of Engineering Physics
Funders: McGill University (MEDA, GMA), Fonds de recherche du Québec en nature et technologies (FRQNT), Plasma‐Québec, CRSNG / NSERC, Canadian Foundation for Innovation (CFI)
PolyPublie URL: https://publications.polymtl.ca/3691/
Journal Title: Plasma Processes and Polymers (vol. 15, no. 7)
Publisher: Wiley
DOI: 10.1002/ppap.201800036
Official URL: https://doi.org/10.1002/ppap.201800036
Date Deposited: 09 Jan 2019 15:44
Last Modified: 11 Apr 2024 05:47
Cite in APA 7: Kasparek, E., Thiry, D., Tavares, J. R., Wertheimer, M. R., Snyders, R., & Girard-Lauriault, P.-L. (2018). Growth mechanisms of sulfur-rich plasma polymers: Binary gas mixtures versus single precursor. Plasma Processes and Polymers, 15(7), 1800036. https://doi.org/10.1002/ppap.201800036


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