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Growth mechanisms of sulfur-rich plasma polymers: Binary gas mixtures versus single precursor

Evelyne Kasparek, Damien Thiry, Jason Robert Tavares, Michael R. Wertheimer, Rony Snyders and Pierre-Luc Girard-Lauriault

Article (2018)

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Cite this document: Kasparek, E., Thiry, D., Tavares, J. R., Wertheimer, M. R., Snyders, R. & Girard-Lauriault, P.-L. (2018). Growth mechanisms of sulfur-rich plasma polymers: Binary gas mixtures versus single precursor. Plasma Processes and Polymers, 15(7), p. 1800036. doi:10.1002/ppap.201800036
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Thiol (SH)‐terminated surfaces have gained interest over the past years due to their potential applications, especially in the biomedical field. In this work, SH‐terminated films have been prepared by “co‐polymerizing” gas mixtures of acetylene (C2H2) and hydrogen sulfide (H2S) using low‐pressure r.f. plasma‐enhanced chemical vapor deposition. R.f. power greatly influences the deposition rate, sulfur content, [S], and thiol concentration, [SH], of the films, as confirmed by XPS (both before and after chemical derivatization), FTIR, and mass spectrometry measurements. These data are compared with those obtained in a similar discharge by using a single molecule precursor, propanethiol. Among other differences, it is demonstrated that [SH] is higher when using binary gas mixtures compared to the single molecule precursor.

Uncontrolled Keywords

Mass spectrometry, plasma polymerization, stability, sulfur-rich organic films, thiol derivatization

Open Access document in PolyPublie
Subjects: 1800 Génie chimique > 1800 Génie chimique
3100 Physique > 3100 Physique
Department: Département de génie chimique
Département de génie physique
Research Center: Non applicable
Funders: McGill University (MEDA, GMA), Fonds de recherche du Québec en nature et technologies (FRQNT), Plasma‐Québec, CRSNG / NSERC, Canadian Foundation for Innovation (CFI)
Date Deposited: 09 Jan 2019 15:44
Last Modified: 08 Apr 2021 10:43
PolyPublie URL: https://publications.polymtl.ca/3691/
Document issued by the official publisher
Journal Title: Plasma Processes and Polymers (vol. 15, no. 7)
Publisher: Wiley
Official URL: https://doi.org/10.1002/ppap.201800036


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