<  Back to the Polytechnique Montréal portal

Evaluation of adhesion of thin films of Si₃N₄ and SiO₂ to si by the scratch method

R. Berriche, P. Leroux and Ludvik Martinu

Paper (1995)

This item is not archived in PolyPublie
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/32567/
Conference Title: International Symposium on Advanced Ceramics for Structural and Tribological Applications
Conference Location: Vancouver, BC, CAN
Conference Date(s): 1995-08-20 - 1995-08-24
Date Deposited: 18 Apr 2023 15:24
Last Modified: 05 Apr 2024 11:23
Cite in APA 7: Berriche, R., Leroux, P., & Martinu, L. (1995, August). Evaluation of adhesion of thin films of Si₃N₄ and SiO₂ to si by the scratch method [Paper]. International Symposium on Advanced Ceramics for Structural and Tribological Applications, Vancouver, BC, CAN.

Statistics

Stats are not available on this system.

Repository Staff Only

View Item View Item