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Efficiency of TiN diffusion barrier between Al and Si prepared by reactive evaporation and rapid thermal annealing

Gérald Gagnon, John F. Currie, J. L. Brebner and T. Darwall

Article (1996)

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Additional Information: Nom historique du département: Département de métallurgie et de génie des matériaux
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/31310/
Journal Title: Journal of Applied Physics (vol. 79, no. 10)
Publisher: American Institute of Physics
DOI: 10.1063/1.362418
Official URL: https://doi.org/10.1063/1.362418
Date Deposited: 18 Apr 2023 15:24
Last Modified: 05 Apr 2024 11:21
Cite in APA 7: Gagnon, G., Currie, J. F., Brebner, J. L., & Darwall, T. (1996). Efficiency of TiN diffusion barrier between Al and Si prepared by reactive evaporation and rapid thermal annealing. Journal of Applied Physics, 79(10), 7612-7620. https://doi.org/10.1063/1.362418

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