Gérald Gagnon, John F. Currie, J. L. Brebner and T. Darwall
Article (1996)
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| Additional Information: | Nom historique du département: Département de métallurgie et de génie des matériaux |
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| Department: | Department of Engineering Physics |
| PolyPublie URL: | https://publications.polymtl.ca/31310/ |
| Journal Title: | Journal of Applied Physics (vol. 79, no. 10) |
| Publisher: | American Institute of Physics |
| DOI: | 10.1063/1.362418 |
| Official URL: | https://doi.org/10.1063/1.362418 |
| Date Deposited: | 18 Apr 2023 15:24 |
| Last Modified: | 08 Apr 2025 06:51 |
| Cite in APA 7: | Gagnon, G., Currie, J. F., Brebner, J. L., & Darwall, T. (1996). Efficiency of TiN diffusion barrier between Al and Si prepared by reactive evaporation and rapid thermal annealing. Journal of Applied Physics, 79(10), 7612-7620. https://doi.org/10.1063/1.362418 |
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