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Bouchard, H., Azelmad, A., Currie, J. F., Meunier, M., Blain, S., & Darwall, T. (avril 1993). Thermal Stress in Doped Silicate Glasses (B,P) Deposited by PECVD and LPCVD [Communication écrite]. 1993 MRS Spring Meeting, San Francisco, CA. Publié dans MRS Proceedings, 308. Lien externe
Gagnon, G., Currie, J. F., Brebner, J. L., & Darwall, T. (1996). Efficiency of TiN diffusion barrier between Al and Si prepared by reactive evaporation and rapid thermal annealing. Journal of Applied Physics, 79(10), 7612-7620. Lien externe
