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Angle-resolved x-ray photoelectron spectroscopy comparison of copper/Teflon AF1600 and aluminum/Kapton metal diffusion

D. Popovici, K. Piyakis, Michel Meunier and Edward Sacher

Article (1998)

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Additional Information: Nom historique du département: Département de génie physique et de génie des matériaux
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/29404/
Journal Title: Journal of Applied Physics (vol. 83, no. 1)
Publisher: American Institute of Physics
DOI: 10.1063/1.366706
Official URL: https://doi.org/10.1063/1.366706
Date Deposited: 18 Apr 2023 15:23
Last Modified: 05 Apr 2024 11:18
Cite in APA 7: Popovici, D., Piyakis, K., Meunier, M., & Sacher, E. (1998). Angle-resolved x-ray photoelectron spectroscopy comparison of copper/Teflon AF1600 and aluminum/Kapton metal diffusion. Journal of Applied Physics, 83(1), 108-111. https://doi.org/10.1063/1.366706

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