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Role of fast sputtered particles during sputter deposition: growth of epitaxial Ge0.99C0.01/Ge(001)

J. D'Arcy-Gall, D. Gall, Patrick Desjardins and I. Petrov

Article (2000)

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Additional Information: Nom historique du département: Département de génie physique et de génie des matériaux
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/28247/
Journal Title: Physical review. B, Condensed matter (vol. 62, no. 16)
Publisher: American Physical Society
DOI: 10.1103/physrevb.62.11203
Official URL: https://doi.org/10.1103/physrevb.62.11203
Date Deposited: 18 Apr 2023 15:21
Last Modified: 05 Apr 2024 11:16
Cite in APA 7: D'Arcy-Gall, J., Gall, D., Desjardins, P., & Petrov, I. (2000). Role of fast sputtered particles during sputter deposition: growth of epitaxial Ge0.99C0.01/Ge(001). Physical review. B, Condensed matter, 62(16), 11203-11208. https://doi.org/10.1103/physrevb.62.11203

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