Michel Meunier
, Maxime Cadotte, Mathieu Ducharme, Yves Gagnon and Alain Lacourse
Paper (2002)
An external link is available for this item
| Department: | Department of Engineering Physics |
|---|---|
| ISBN: | 081944376X |
| PolyPublie URL: | https://publications.polymtl.ca/26426/ |
| Conference Title: | Photon Processing in Microelectronics and Photonics |
| Conference Location: | San Jose, Ca., USA |
| Conference Date(s): | 2002-01-21 - 2002-01-24 |
| Publisher: | SPIE - International Society for Optical Engineering |
| DOI: | 10.1117/12.470672 |
| Official URL: | https://doi.org/10.1117/12.470672 |
| Date Deposited: | 18 Apr 2023 15:20 |
| Last Modified: | 08 Apr 2025 02:15 |
| Cite in APA 7: | Meunier, M., Cadotte, M., Ducharme, M., Gagnon, Y., & Lacourse, A. (2002, January). Laser induced diffusible resistance: device characterization and process modeling [Paper]. Photon Processing in Microelectronics and Photonics, San Jose, Ca., USA. https://doi.org/10.1117/12.470672 |
|---|---|
Statistics
Dimensions
Repository Staff Only
|
View Item |
