Laser induced diffusible resistance: device characterization and process modeling

Michel Meunier, Maxime Cadotte, Mathieu Ducharme, Yves Gagnon, Alain Lacourse

Paper (2002)

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Department:
Department of Engineering Physics
ISBN:
081944376X
PolyPublie URL:
https://publications.polymtl.ca/26426/
Conference Title:
Photon Processing in Microelectronics and Photonics
Conference Location:
San Jose, Ca., USA
Conference Date(s):
2002-01-21 - 2002-01-24
Publisher:
SPIE - International Society for Optical Engineering
DOI:
10.1117/12.470672
Official URL:
https://doi.org/10.1117/12.470672
OAI:
oai:publications.polymtl.ca:26426
ORCID
Date Deposited:
18 Apr 2023 15:20
Last Modified:
08 Oct 2026 17:29
Cite in APA 7:
Meunier, M., Cadotte, M., Ducharme, M., Gagnon, Y., & Lacourse, A. (2002, January). Laser induced diffusible resistance: device characterization and process modeling [Paper]. Photon Processing in Microelectronics and Photonics, San Jose, Ca., USA. https://doi.org/10.1117/12.470672

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