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Laser induced diffusible resistance: device characterization and process modeling

Michel Meunier, M. Cadotte, M. Ducharme, Y. Gagnon and A. Lacourse

Paper (2002)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/26426/
Conference Title: Photon Processing in Microelectronics and Photonics
Conference Location: San Jose, Ca., USA
Conference Date(s): 2002-01-21 - 2002-01-24
Publisher: SPIE - International Society for Optical Engineering
DOI: 10.1117/12.470672
Official URL: https://doi.org/10.1117/12.470672
Date Deposited: 18 Apr 2023 15:20
Last Modified: 05 Apr 2024 11:13
Cite in APA 7: Meunier, M., Cadotte, M., Ducharme, M., Gagnon, Y., & Lacourse, A. (2002, January). Laser induced diffusible resistance: device characterization and process modeling [Paper]. Photon Processing in Microelectronics and Photonics, San Jose, Ca., USA. https://doi.org/10.1117/12.470672

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