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Microscale Chemical and Electrostatic Surface Patterning of Dow Cyclotene by N₂ Plasma

D.-Q. Yang, Suzie Poulin, Ludvik Martinu, Jolanta-Ewa Sapieha, O. Zabeida and Edward Sacher

Article (2005)

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Department: Department of Engineering Physics
Research Center: RQMP - Regroupement québécois sur les matériaux de pointe
PolyPublie URL: https://publications.polymtl.ca/23530/
Journal Title: Applied Surface Science (vol. 242, no. 3-4)
Publisher: Elsevier
DOI: 10.1016/j.apsusc.2004.09.077
Official URL: https://doi.org/10.1016/j.apsusc.2004.09.077
Date Deposited: 18 Apr 2023 15:19
Last Modified: 05 Apr 2024 11:08
Cite in APA 7: Yang, D.-Q., Poulin, S., Martinu, L., Sapieha, J.-E., Zabeida, O., & Sacher, E. (2005). Microscale Chemical and Electrostatic Surface Patterning of Dow Cyclotene by N₂ Plasma. Applied Surface Science, 242(3-4), 419-427. https://doi.org/10.1016/j.apsusc.2004.09.077

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