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Pulsed radio frequency plasma deposition of a-SiNₓ:H alloys: film properties, growth mechanism, and applications

R. Vernhes, O. Zabeida, Jolanta-Ewa Sapieha and Ludvik Martinu

Article (2006)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/22410/
Journal Title: Journal of Applied Physics (vol. 100, no. 6)
Publisher: American Institute of Physics
DOI: 10.1063/1.2349565
Official URL: https://doi.org/10.1063/1.2349565
Date Deposited: 18 Apr 2023 15:18
Last Modified: 05 Apr 2024 11:06
Cite in APA 7: Vernhes, R., Zabeida, O., Sapieha, J.-E., & Martinu, L. (2006). Pulsed radio frequency plasma deposition of a-SiNₓ:H alloys: film properties, growth mechanism, and applications. Journal of Applied Physics, 100(6), 63308-1. https://doi.org/10.1063/1.2349565

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