J. A. Kittl, M. A. Pawlak, C. Torregiani, A. Lauwers, C. Demeurisse, C. Vrancken, P. P. Absil, S. Biesemans, C. Coia, C. Detavernier, J. Jordan-Sweet and Christian Lavoie
Article (2007)
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| Department: | Department of Engineering Physics |
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| PolyPublie URL: | https://publications.polymtl.ca/21789/ |
| Journal Title: | Applied Physics Letters (vol. 91, no. 17) |
| Publisher: | American Institute of Physics |
| DOI: | 10.1063/1.2799247 |
| Official URL: | https://doi.org/10.1063/1.2799247 |
| Date Deposited: | 18 Apr 2023 15:16 |
| Last Modified: | 08 Apr 2025 02:09 |
| Cite in APA 7: | Kittl, J. A., Pawlak, M. A., Torregiani, C., Lauwers, A., Demeurisse, C., Vrancken, C., Absil, P. P., Biesemans, S., Coia, C., Detavernier, C., Jordan-Sweet, J., & Lavoie, C. (2007). Transient and End Silicide Phase Formation in Thin Film Ni/Polycrystalline-Si Reactions for Fully Silicided Gate Applications. Applied Physics Letters, 91(17). https://doi.org/10.1063/1.2799247 |
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