Chemical Characterisation of Nitrogen-Rich Plasma-Polymer Films Deposited in Dielectric Barrier Discharges at Atmospheric Pressure

Pierre-Luc Girard-Lauriault, Patrick Desjardins, Wolfgang E. S. Unger, Andreas Lippitz and Michael R. Wertheimer

Article (2008)

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Department:	Department of Engineering Physics
Research Center:	GCM - Thin Film Physics and Technology Research Group
PolyPublie URL:	https://publications.polymtl.ca/20747/
Journal Title:	Plasma Processes and Polymers (vol. 5, no. 7)
Publisher:	Wiley
DOI:	10.1002/ppap.200800054
Official URL:	https://doi.org/10.1002/ppap.200800054
Date Deposited:	18 Apr 2023 15:15
Last Modified:	08 Apr 2025 02:07

Cite in APA 7:	Girard-Lauriault, P.-L., Desjardins, P., Unger, W. E. S., Lippitz, A., & Wertheimer, M. R. (2008). Chemical Characterisation of Nitrogen-Rich Plasma-Polymer Films Deposited in Dielectric Barrier Discharges at Atmospheric Pressure. Plasma Processes and Polymers, 5(7), 631-644. https://doi.org/10.1002/ppap.200800054
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