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Exploitation of a self-limiting process for reproducible formation of ultrathin Ni1-xPtx silicide films

Zhen Zhang, Bin Yang, Yu Zhu, Simon Gaudet, Steve Rossnagel, Andrew J. Kellock, Ahmet Ozcan, Conal Murray, Patrick Desjardins, Shi-Li Zhang, Jean Jordan-Sweet and Christian Lavoie

Article (2010)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/17404/
Journal Title: Applied Physics Letters (vol. 97, no. 25)
Publisher: American Institute of Physics
DOI: 10.1063/1.3529459
Official URL: https://doi.org/10.1063/1.3529459
Date Deposited: 18 Apr 2023 15:14
Last Modified: 05 Apr 2024 10:58
Cite in APA 7: Zhang, Z., Yang, B., Zhu, Y., Gaudet, S., Rossnagel, S., Kellock, A. J., Ozcan, A., Murray, C., Desjardins, P., Zhang, S.-L., Jordan-Sweet, J., & Lavoie, C. (2010). Exploitation of a self-limiting process for reproducible formation of ultrathin Ni1-xPtx silicide films. Applied Physics Letters, 97(25), 252108-252108. https://doi.org/10.1063/1.3529459

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