Zhen Zhang, Bin Yang, Yu Zhu, Simon Gaudet, Steve Rossnagel, Andrew J. Kellock, Ahmet Ozcan, Conal Murray, Patrick Desjardins
, Shi-Li Zhang, Jean Jordan-Sweet and Christian Lavoie
Article (2010)
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| Department: | Department of Engineering Physics |
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| PolyPublie URL: | https://publications.polymtl.ca/17404/ |
| Journal Title: | Applied Physics Letters (vol. 97, no. 25) |
| Publisher: | American Institute of Physics |
| DOI: | 10.1063/1.3529459 |
| Official URL: | https://doi.org/10.1063/1.3529459 |
| Date Deposited: | 18 Apr 2023 15:14 |
| Last Modified: | 08 Apr 2025 01:45 |
| Cite in APA 7: | Zhang, Z., Yang, B., Zhu, Y., Gaudet, S., Rossnagel, S., Kellock, A. J., Ozcan, A., Murray, C., Desjardins, P., Zhang, S.-L., Jordan-Sweet, J., & Lavoie, C. (2010). Exploitation of a self-limiting process for reproducible formation of ultrathin Ni1-xPtx silicide films. Applied Physics Letters, 97(25), 252108-252108. https://doi.org/10.1063/1.3529459 |
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