Simon Gaudet, Patrick Desjardins
and C. Lavoie
Article (2011)
An external link is available for this item
| Department: | Department of Engineering Physics |
|---|---|
| Research Center: | RQMP - Regroupement québécois sur les matériaux de pointe |
| PolyPublie URL: | https://publications.polymtl.ca/16861/ |
| Journal Title: | Journal of Applied Physics (vol. 110, no. 11) |
| Publisher: | American Institute of Physics |
| DOI: | 10.1063/1.3662110 |
| Official URL: | https://doi.org/10.1063/1.3662110 |
| Date Deposited: | 18 Apr 2023 15:12 |
| Last Modified: | 27 Sep 2024 11:08 |
| Cite in APA 7: | Gaudet, S., Desjardins, P., & Lavoie, C. (2011). The thermally-induced reaction of thin Ni films with Si : Effect of the substrate orientation. Journal of Applied Physics, 110(11). https://doi.org/10.1063/1.3662110 |
|---|---|
Statistics
Dimensions
Repository Staff Only
|
View Item |
