<  Back to the Polytechnique Montréal portal

Ultra-shallow chemical characterization of organic thin films deposited by plasma and vacuum-ultraviolet, using angle- and excitation energy-resolved XPS

Pierre-Luc Girard-Lauriault, Juan-Carlos Ruiz, Thomas Gross, Michael R. Wertheimer and Wolfgang E. S. Unger

Article (2011)

An external link is available for this item
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/16835/
Journal Title: Plasma Chemistry and Plasma Processing (vol. 31, no. 4)
Publisher: Springer
DOI: 10.1007/s11090-011-9306-3
Official URL: https://doi.org/10.1007/s11090-011-9306-3
Date Deposited: 18 Apr 2023 15:12
Last Modified: 05 Apr 2024 10:58
Cite in APA 7: Girard-Lauriault, P.-L., Ruiz, J.-C., Gross, T., Wertheimer, M. R., & Unger, W. E. S. (2011). Ultra-shallow chemical characterization of organic thin films deposited by plasma and vacuum-ultraviolet, using angle- and excitation energy-resolved XPS. Plasma Chemistry and Plasma Processing, 31(4), 535-550. https://doi.org/10.1007/s11090-011-9306-3

Statistics

Dimensions

Repository Staff Only

View Item View Item