Ultra-shallow chemical characterization of organic thin films deposited by plasma and vacuum-ultraviolet, using angle- and excitation energy-resolved XPS

Pierre-Luc Girard-Lauriault, Juan-Carlos Ruiz, Thomas Gross, Michael R. Wertheimer and Wolfgang E. S. Unger

Article (2011)

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Department:	Department of Engineering Physics
PolyPublie URL:	https://publications.polymtl.ca/16835/
Journal Title:	Plasma Chemistry and Plasma Processing (vol. 31, no. 4)
Publisher:	Springer
DOI:	10.1007/s11090-011-9306-3
Official URL:	https://doi.org/10.1007/s11090-011-9306-3
Date Deposited:	18 Apr 2023 15:12
Last Modified:	08 Apr 2025 01:44

Cite in APA 7:	Girard-Lauriault, P.-L., Ruiz, J.-C., Gross, T., Wertheimer, M. R., & Unger, W. E. S. (2011). Ultra-shallow chemical characterization of organic thin films deposited by plasma and vacuum-ultraviolet, using angle- and excitation energy-resolved XPS. Plasma Chemistry and Plasma Processing, 31(4), 535-550. https://doi.org/10.1007/s11090-011-9306-3
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