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Girard-Lauriault, P.-L., Ruiz, J.-C., Gross, T., Wertheimer, M. R., & Unger, W. E. S. (2011). Ultra-shallow chemical characterization of organic thin films deposited by plasma and vacuum-ultraviolet, using angle- and excitation energy-resolved XPS. Plasma Chemistry and Plasma Processing, 31(4), 535-550. Lien externe
