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Tailoring the growth rate and surface facet for synthesis of high-quality continuous graphene films from CH₄ at 750 °C via chemical vapor deposition

Robert M. Jacobberger, Pierre L. Levesque, Feng Xu, Meng-Yin Wu, Saman Choubak, Patrick Desjardins, Richard Martel and Michael S. Arnold

Article (2015)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/11138/
Journal Title: Journal of Physical Chemistry C (vol. 119, no. 21)
Publisher: American Chemical Society (ACS)
DOI: 10.1021/jp5116355
Official URL: https://doi.org/10.1021/jp5116355
Date Deposited: 18 Apr 2023 15:07
Last Modified: 05 Apr 2024 10:49
Cite in APA 7: Jacobberger, R. M., Levesque, P. L., Xu, F., Wu, M.-Y., Choubak, S., Desjardins, P., Martel, R., & Arnold, M. S. (2015). Tailoring the growth rate and surface facet for synthesis of high-quality continuous graphene films from CH₄ at 750 °C via chemical vapor deposition. Journal of Physical Chemistry C, 119(21), 11516-11523. https://doi.org/10.1021/jp5116355

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