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Gruning, U., Gujrathi, S. C., Poulin, S., Diawara, Y., & Yelon, A. (1994). Remote oxygen-containing hydrogen plasma treatment of porous silicon. Journal of Applied Physics, 75(12), 8075-9. Lien externe
Ivanov, D., Currie, J. F., Bouchard, H., Lecours, A., Andrian, J., Yelon, A., & Poulin, S. (1994). Sputtered silicate-limit NASICON thin films for electrochemical sensors. Solid State Ionics, 67(3-4), 295-299. Lien externe