Documents publiés en "1989"

B

Blain, S., Sapieha, J.-E., Wertheimer, M. R., & Gujrathi, S. C. (1989). Silicon oxynitride from microwave plasma: fabrication and characterization. Canadian Journal of Physics, 67(4), 190-194. Lien externe

M

Martinu, L., Sapieha, J.-E., & Wertheimer, M. R. (1989). Dual‐mode microwave/radio frequency plasma deposition of dielectric thin films. Applied Physics Letters, 54(26), 2645-2647. Lien externe

Martinu, L., Sapieha, J.-E., & Wertheimer, M. R. (septembre 1989). Deposition of semiconducting and dielectric films in "dual-" and "single-mode" microwave or radio frequency [Communication écrite]. 9th International Symposium on Plasma Chemistry (ISPC 1989), Pugnochiuso, Italy. Lien externe

R

Rabiller, P., Sapieha, J.-E., Wertheimer, M. R., & Yelon, A. (juillet 1989). Electrical properties of a-SiOₓNy :H films prepared by microwave PECVD [Communication écrite]. 3rd International Conference on Conduction and Breakdown in Solid Dielectrics, Trondheim, Norway. Lien externe