Documents dont l'auteur est "Kuttel, O. M."

Martinu, L., Sapieha, J.-E., Kuttel, O. M., Raveh, A., & Wertheimer, M. R. (novembre 1993). Critical ion energy and ion flux in the growth of films by plasma-enhanced chemical-vapor deposition [Communication écrite]. 40th National Symposium of the American Vacuum Society, Orlando, FL. Publié dans Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 12(4, pt. 1). Lien externe

Martinu, L., Sapieha, J.-E., Kuttel, O. M., & Wertheimer, M. R. (octobre 1990). Electrical properties of dual-frequency plasma deposited silicon-compound films [Communication écrite]. Annual Conference on Electrical Insulation and Dielectric Phenomena, Pocono Manor, PA, USA. Lien externe