Monter d'un niveau |
Drouin, D., Beauvais, J., Lemire, R., Lavallée, E., Gauvin, R., & Caron, M. (1997). Method for fabricating submicron silicide structures on silicon using a resistless electron beam lithography process. Applied Physics Letters, 70(22), 3020-3022. Lien externe
Caron, M., Gagnon, G., Gauvin, R., Hovington, P., Drouin, D., Currie, J. F., Tremblay, Y., Ouellet, L., Bigerger, M., & Wong, F. (juin 1996). An iterative procedure based on Monte Carlo simulation to determine the thickness and composition of VLSI metallization [Communication écrite]. 13th International VLSI Multilevel Interconnection (V-MIC) Conference, Santa Clara, CA, USA. Non disponible