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Method for fabricating submicron silicide structures on silicon using a resistless electron beam lithography process

D. Drouin, J. Beauvais, R. Lemire, E. Lavallée, Raymond Gauvin and M. Caron

Article (1997)

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Department: Department of Mechanical Engineering
PolyPublie URL: https://publications.polymtl.ca/30509/
Journal Title: Applied Physics Letters (vol. 70, no. 22)
Publisher: American Institute of Physics
DOI: 10.1063/1.118736
Official URL: https://doi.org/10.1063/1.118736
Date Deposited: 18 Apr 2023 15:23
Last Modified: 05 Apr 2024 11:19
Cite in APA 7: Drouin, D., Beauvais, J., Lemire, R., Lavallée, E., Gauvin, R., & Caron, M. (1997). Method for fabricating submicron silicide structures on silicon using a resistless electron beam lithography process. Applied Physics Letters, 70(22), 3020-3022. https://doi.org/10.1063/1.118736

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