D. Drouin, J. Beauvais, R. Lemire, E. Lavallée, Raymond Gauvin and M. Caron
Article (1997)
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| Department: | Department of Mechanical Engineering |
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| PolyPublie URL: | https://publications.polymtl.ca/30509/ |
| Journal Title: | Applied Physics Letters (vol. 70, no. 22) |
| Publisher: | American Institute of Physics |
| DOI: | 10.1063/1.118736 |
| Official URL: | https://doi.org/10.1063/1.118736 |
| Date Deposited: | 18 Apr 2023 15:23 |
| Last Modified: | 08 Apr 2025 02:21 |
| Cite in APA 7: | Drouin, D., Beauvais, J., Lemire, R., Lavallée, E., Gauvin, R., & Caron, M. (1997). Method for fabricating submicron silicide structures on silicon using a resistless electron beam lithography process. Applied Physics Letters, 70(22), 3020-3022. https://doi.org/10.1063/1.118736 |
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