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Items where Author is "D'Heurle, F. M."

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Coia, C., Lavoie, C., D'Heurle, F. M., Detavernier, C., Desjardins, P., & Kellock, A. J. (2005, May). Reactive diffusion in the Ni-Si system: Influence of Ni thickness on the phase formation sequence [Paper]. 207th Meeting of the Electrochemical Society, Québec, Canada. External link


Lavoie, C., Purtell, R., Coïa, C., Detavernier, C., Desjardins, P., Jordan-Sweet, J., Cabral, C. J., & D'Heurle, F. M. (2002, May). In situ monitoring of thin film reactions during rapid thermal annealing: nickel silicide formation [Paper]. Rapid thermal and other short-time processing technologies III Electrochemical Society, Philadelphia, PA, USA. External link

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