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Documents dont l'auteur est "Aoki, T."

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Aller à : 2003 | 2002
Nombre de documents: 4

2003

Wróbel, A. M., Walkiewicz-Pietrzykowska, A., Sapieha, J.-E., Nakanishi, Y., Aoki, T., & Hatanaka, Y. (2003). Remote Hydrogen Plasma Chemical Vapor Deposition From (Dimethylsilyl)(Trimethylsilyl)Methane. 1. Kinetics of the Process; Chemical and Morphological Structure of Deposited Silicon-Carbon Films. Chemistry of Materials, 15(8), 1749-1756. Lien externe

Wróbel, A. M., Walkiewicz-Pietrzykowska, A., Bielinski, D. M., Sapieha, J.-E., Nakanishi, Y., Aoki, T., & Hatanaka, Y. (2003). Remote Hydrogen Plasma Chemical Vapor Deposition From (Dimethylsilyl)(Trimethylsilyl)Methane. 2. Property-Structure Relationships for Resulting Silicon-Carbon Films. Chemistry of Materials, 15(8), 1757-1762. Lien externe

Wrobel, A. M., Blaszczyk, I., Walkiewicz-Pietrzykowska, A., Tracz, A., Sapieha, J.-E., Aoki, T., & Hatanaka, Y. (2003). Remote Hydrogen-Nitrogen Plasma Chemical Vapor Deposition From a Tetramethyldisilazane Source. Part 1. Mechanism of the Process, Structure and Surface Morphology of Deposited Amorphous Hydrogenated Silicon Carbonitride Films. Journal of Materials Chemistry, 13(4), 731-737. Lien externe

2002

Wróbel, A. M., Walkiewicz-Pietrzykowska, A., Sapieha, J.-E., Hatanaka, Y., Aoki, T., & Nakanishi, Y. (2002). Remote Hydrogen Plasma Chemical Vapor Deposition of Silicon- Carbon Thin-Film Materials From a Hexamethyldisilane Source: Characterization of the Process and the Deposits. Journal of Applied Polymer Science, 86(6), 1445-1458. Lien externe

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