A. M. Wróbel, I. Blaszczyk, A. Walkiewicz-Pietrzykowska, A. Tracz, Jolanta-Ewa Sapieha
, T. Aoki and Y. Hatanaka
Article (2003)
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| Department: | Department of Engineering Physics |
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| PolyPublie URL: | https://publications.polymtl.ca/25411/ |
| Journal Title: | Journal of Materials Chemistry (vol. 13, no. 4) |
| Publisher: | The Royal Society of Chemistry |
| DOI: | 10.1039/b211415c |
| Official URL: | https://doi.org/10.1039/b211415c |
| Date Deposited: | 18 Apr 2023 15:20 |
| Last Modified: | 25 Sep 2024 16:05 |
| Cite in APA 7: | Wróbel, A. M., Blaszczyk, I., Walkiewicz-Pietrzykowska, A., Tracz, A., Sapieha, J.-E., Aoki, T., & Hatanaka, Y. (2003). Remote Hydrogen-Nitrogen Plasma Chemical Vapor Deposition From a Tetramethyldisilazane Source. Part 1. Mechanism of the Process, Structure and Surface Morphology of Deposited Amorphous Hydrogenated Silicon Carbonitride Films. Journal of Materials Chemistry, 13(4), 731-737. https://doi.org/10.1039/b211415c |
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