A. M. Wróbel, I. Blaszczyk, A. Walkiewicz-Pietrzykowska, A. Tracz, Jolanta-Ewa Sapieha
, T. Aoki, Y. Hatanaka
Article (2003)
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Department:
Funders:
Polish State Committee for Scientific Research (KBN)
Grant number:
7T08C03118
PolyPublie URL:
Journal Title
:
Journal of Materials Chemistry
(
vol.
13
,
no.
4
)
Publisher:
The Royal Society of Chemistry
DOI:
Official URL:
OAI:
oai:publications.polymtl.ca:25411
ORCID
Date Deposited:
18 Apr 2023 15:20
Last Modified:
08 Oct 2026 17:26
Cite in APA 7:
Wróbel, A. M., Blaszczyk, I., Walkiewicz-Pietrzykowska, A., Tracz, A., Sapieha, J.-E., Aoki, T., & Hatanaka, Y. (2003). Remote Hydrogen-Nitrogen Plasma Chemical Vapor Deposition From a Tetramethyldisilazane Source. Part 1. Mechanism of the Process, Structure and Surface Morphology of Deposited Amorphous Hydrogenated Silicon Carbonitride Films. Journal of Materials Chemistry, 13(4), 731-737. https://doi.org/10.1039/b211415c
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