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Remote Hydrogen Plasma Chemical Vapor Deposition of Silicon- Carbon Thin-Film Materials From a Hexamethyldisilane Source: Characterization of the Process and the Deposits

A. M. Wróbel, A. Walkiewicz-Pietrzykowska, Jolanta-Ewa Sapieha, Y. Hatanaka, T. Aoki and Y. Nakanishi

Article (2002)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/26195/
Journal Title: Journal of Applied Polymer Science (vol. 86, no. 6)
Publisher: Wiley
DOI: 10.1002/app.11304
Official URL: https://doi.org/10.1002/app.11304
Date Deposited: 18 Apr 2023 15:21
Last Modified: 05 Apr 2024 11:13
Cite in APA 7: Wróbel, A. M., Walkiewicz-Pietrzykowska, A., Sapieha, J.-E., Hatanaka, Y., Aoki, T., & Nakanishi, Y. (2002). Remote Hydrogen Plasma Chemical Vapor Deposition of Silicon- Carbon Thin-Film Materials From a Hexamethyldisilane Source: Characterization of the Process and the Deposits. Journal of Applied Polymer Science, 86(6), 1445-1458. https://doi.org/10.1002/app.11304

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