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Microstructure and growth kinetics of nickel silicide ultra-thin films synthesized by solid-state reactions

Cédrik Coia

PhD thesis (2008)

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Cite this document: Coia, C. (2008). Microstructure and growth kinetics of nickel silicide ultra-thin films synthesized by solid-state reactions (PhD thesis, École Polytechnique de Montréal). Retrieved from https://publications.polymtl.ca/8192/
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Abstract

Technological importance of silicides -- Scaling issues with silicide processes -- Thin-film solid-state reactions in the Ni-Si system -- Background : formation of new compounds from the reaction of two adjacent solid phases -- Some important thin film growth kinetics models -- Formation of Ni silicides by solid-state reaction between Ni and Si : literature review -- Formation of the first compound and compound sequence -- Mobile species and growth kinetics -- Influence of impurities -- Experimental techniques -- Sample preparation -- In situ real time X-ray diffraction -- Transmission electron microscopy -- Complementary techniques -- Non-sequential formation and lateral co-existence of coumpounds during solid-state reaction in the Ni-Si system -- Effects of Ni-alloying, implanted impurities, and substrate crystallinity -- Growth kinetics of [thêta]-Nib2sSi on undoped and F-implanted Si (001) substrates.

Uncontrolled Keywords

Siliciures; Couches minces de nickel

Open Access document in PolyPublie
Additional Information: Le fichier PDF de ce document a été produit par Bibliothèque et Archives Canada selon les termes du programme Thèses Canada https://canada.on.worldcat.org/oclc/643660742
Department: Département de génie physique
Date Deposited: 04 Aug 2021 11:04
Last Modified: 25 Aug 2021 14:58
PolyPublie URL: https://publications.polymtl.ca/8192/

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