Etching of a-C:H films by an atomic oxygen beam

Emmanuel Bourdon, A. Raveh, Subhash C. Gujrathi and Ludvik Martinu

Article (1993)

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Department:	Department of Engineering Physics
Research Center:	GCM - Thin Film Physics and Technology Research Group
PolyPublie URL:	https://publications.polymtl.ca/70926/
Journal Title:	Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (vol. 11, no. 5)
Publisher:	American Institute of Physics
DOI:	10.1116/1.578603
Official URL:	https://doi.org/10.1116/1.578603
Date Deposited:	18 Dec 2025 15:42
Last Modified:	18 Dec 2025 15:42

Cite in APA 7:	Bourdon, E., Raveh, A., Gujrathi, S. C., & Martinu, L. (1993). Etching of a-C:H films by an atomic oxygen beam. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, 11(5), 2530-2535. https://doi.org/10.1116/1.578603
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