Jelly Demeulemeester, A. Schrauwen, Osamu Nakatsuka, Shigeaki Zaima, M. Adachi, Yosuke Shimura, C. M. Comrie, Claudia Fleischmann, Christophe Detavernier, K. Temst and A. Vantomme
Article (2011)
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| Department: | Department of Engineering Physics |
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| Research Center: | RQMP - Regroupement québécois sur les matériaux de pointe |
| Funders: | FWO, JSPS (Japan), NRF in South Africa, SPIRIT |
| Grant number: | GOA/2009/006, CREA/07/005, IAP P6/42, 227012 |
| PolyPublie URL: | https://publications.polymtl.ca/69291/ |
| Journal Title: | Applied Physics Letters (vol. 99, no. 21) |
| Publisher: | American Institute of Physics |
| DOI: | 10.1063/1.3662925 |
| Official URL: | https://doi.org/10.1063/1.3662925 |
| Date Deposited: | 29 Oct 2025 11:21 |
| Last Modified: | 29 Oct 2025 11:21 |
| Cite in APA 7: | Demeulemeester, J., Schrauwen, A., Nakatsuka, O., Zaima, S., Adachi, M., Shimura, Y., Comrie, C. M., Fleischmann, C., Detavernier, C., Temst, K., & Vantomme, A. (2011). Sn diffusion during Ni germanide growth on Ge1–xSnx. Applied Physics Letters, 99(21), 211905 (3 pages). https://doi.org/10.1063/1.3662925 |
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