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Enhanced Nanoscale Ge Concentration Oscillations in Si/SiGe Quantum Well through Controlled Segregation

Kevin-P. Gradwohl, Lukas Cvitkovich, Chen-Hsun Lu, Sebastian Koelling, Maximilian Oezkent, Yujia Liu, Dominic Waldhör, Tibor Grasser, Yann-Michel Niquet, M. Albrecht, Carsten Richter, Oussama Moutanabbir and Jens Martin

Discussion or Letter (2025)

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Department: Department of Engineering Physics
Funders: Federal Ministry of Education and Research (BMBF), Leibniz Association, European Union’s Horizon 2020, European Research Council (ERC), NSERC, Canada Research Chairs, Canada Foundation for Innovation, Mitacs, PRIMA Québec, Defence Canada, U.S. Army Research Office, Air Force Office of Scientific and Research
Grant number: Project 13N15659, Project K124/2018, 871813, 101055379, 101070700, W911NF-22-1-0277, FA9550-23-1-0763
PolyPublie URL: https://publications.polymtl.ca/63275/
Journal Title: Nano Letters
Publisher: American Chemical Society
DOI: 10.1021/acs.nanolett.4c05326
Official URL: https://doi.org/10.1021/acs.nanolett.4c05326
Date Deposited: 06 Mar 2025 10:45
Last Modified: 09 Apr 2025 01:48
Cite in APA 7: Gradwohl, K.-P., Cvitkovich, L., Lu, C.-H., Koelling, S., Oezkent, M., Liu, Y., Waldhör, D., Grasser, T., Niquet, Y.-M., Albrecht, M., Richter, C., Moutanabbir, O., & Martin, J. (2025). Enhanced Nanoscale Ge Concentration Oscillations in Si/SiGe Quantum Well through Controlled Segregation [Discussion or Letter]. Nano Letters. https://doi.org/10.1021/acs.nanolett.4c05326

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