Manfred Nachman and Pham Cong Thanh
Article (1991)
An external link is available for this item| Department: | Department of Electrical Engineering |
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| PolyPublie URL: | https://publications.polymtl.ca/62791/ |
| Journal Title: | IEEE Transactions on Plasma Science (vol. 19, no. 2) |
| Publisher: | Institute of Electrical and Electronics Engineers |
| DOI: | 10.1109/27.106841 |
| Official URL: | https://doi.org/10.1109/27.106841 |
| Date Deposited: | 21 Feb 2025 10:16 |
| Last Modified: | 21 Feb 2025 10:16 |
| Cite in APA 7: | Nachman, M., & Thanh, P. C. (1991). Thickness of the ion sheath around a cylindrical electrode in a plasma. IEEE Transactions on Plasma Science, 19(2), 423-427. https://doi.org/10.1109/27.106841 |
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