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Autocatalytic Deposition of Nickel–Boron Diffusion Barrier onto Diazonium-Treated SiO2 for High Aspect Ratio Through-Silicon Via Technology in 3D Integration

Gul Zeb, Tien Dat Nguyen, Thi Phuong Ly Giang and Xuan Tuan Le

Article (2024)

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Department: Department of Chemical Engineering
PolyPublie URL: https://publications.polymtl.ca/57861/
Journal Title: ACS Applied Electronic Materials
Publisher: American Chemical Society
DOI: 10.1021/acsaelm.4c00062
Official URL: https://doi.org/10.1021/acsaelm.4c00062
Date Deposited: 28 Mar 2024 15:20
Last Modified: 05 Apr 2024 12:06
Cite in APA 7: Zeb, G., Nguyen, T. D., Giang, T. P. L., & Le, X. T. (2024). Autocatalytic Deposition of Nickel–Boron Diffusion Barrier onto Diazonium-Treated SiO2 for High Aspect Ratio Through-Silicon Via Technology in 3D Integration. ACS Applied Electronic Materials, 00062 (8 pages). https://doi.org/10.1021/acsaelm.4c00062

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