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Refractory Plasmonics of Reactively Sputtered Hafnium Nitride Nanoparticles: Pushing Limits

Pavel Pleskunov, Mariia Protsak, Zdenk Krtou, Tereza Koutova, Marco Tosca, Kateryna Biliak, Veronika ervenkova, Daniil Nikitin, Jan Hanu, Miroslav Cieslar, Ivan Gordeev, Milan Dopita, Michael Vorochta, Jaroslav Kousal, Ludvik Martinu and Andrei Choukourov

Article (2024)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/57783/
Journal Title: Advanced Optical Materials
Publisher: John Wiley and Sons
DOI: 10.1002/adom.202302715
Official URL: https://doi.org/10.1002/adom.202302715
Date Deposited: 28 Mar 2024 15:20
Last Modified: 05 Apr 2024 12:05
Cite in APA 7: Pleskunov, P., Protsak, M., Krtou, Z., Koutova, T., Tosca, M., Biliak, K., Ervenkova, V., Nikitin, D., Hanu, J., Cieslar, M., Gordeev, I., Dopita, M., Vorochta, M., Kousal, J., Martinu, L., & Choukourov, A. (2024). Refractory Plasmonics of Reactively Sputtered Hafnium Nitride Nanoparticles: Pushing Limits. Advanced Optical Materials, 202302715 (13 pages). https://doi.org/10.1002/adom.202302715

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