Doped SiO thin films for integrated optics and microelectronics

Method of preparation of solution deposited -- Thin films -- Determination of the film thickness and its index of refraction -- Determination of refractive index and thickness of solution deposited thin films on silicon and glass -- Normalised reflectance of absorbing films on absorbing or transparent substrates -- Experimental use of the normalised reflectance method -- Solution deposited SiO2 on Si, GaAs and InP -- Mechanical properties and film homogeneity -- Antireflective, protective and waveguide.