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Coherent X-ray diffraction imaging and characterization of strain in silicon-on-insulator nanostructures

G. Xiong, Oussama Moutanabbir, M. Reiche, R. Harder and I. Robinson

Article (2014)

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Coherent X-ray diffraction imaging (CDI) has emerged in the last decade as a promising high resolution lens-less imaging approach for the characterization of various samples. It has made significant technical progress through developments in source, algorithm and imaging methodologies thus enabling important scientific breakthroughs in a broad range of disciplines. In this report, we will introduce the principles of forward scattering CDI and Bragg geometry CDI (BCDI), with an emphasis on the latter. BCDI exploits the ultra-high sensitivity of the diffraction pattern to the distortions of crystalline lattice. Its ability of imaging strain on the nanometer scale in three dimensions is highly novel. We will present the latest progress on the application of BCDI in investigating the strain relaxation behavior in nanoscale patterned strained silicon-on-insulator (sSOI) materials, aiming to understand and engineer strain for the design and implementation of new generation semiconductor devices.

Uncontrolled Keywords

coherent X-ray diffraction Imaging; nanowire; silicon-on-Insulator; strain; ultrathin layer

Department: Department of Engineering Physics
Funders: European Research Council as an FP7 Advanced grant “Nanosculpture", I-Halle by the German Federal Ministry of Education and Research in the framework of the DECISIF project
Grant number: 27711, 3 N 9881
PolyPublie URL: https://publications.polymtl.ca/5174/
Journal Title: Advanced Materials (vol. 26, no. 46)
Publisher: Wiley‐Blackwell
DOI: 10.1002/adma.201304511
Official URL: https://doi.org/10.1002/adma.201304511
Date Deposited: 08 Apr 2022 11:16
Last Modified: 08 Apr 2024 10:29
Cite in APA 7: Xiong, G., Moutanabbir, O., Reiche, M., Harder, R., & Robinson, I. (2014). Coherent X-ray diffraction imaging and characterization of strain in silicon-on-insulator nanostructures. Advanced Materials, 26(46), 7747-7763. https://doi.org/10.1002/adma.201304511


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