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Chemical Speciation and Mapping of the Si in Si Doped LFP Ingot with Synchrotron Radiation Technique

Mohammad Norouzi Banis, Zhiqiang Wang, Steeve Rousselot, Yulong Liu, Yongfeng Hu, Majid Talebi-Esfandarani, Thomas Bibienne, Michel Gauthier, Ruying Li, Guoxian Liang, Mickaël Dollé, Pierre Sauriol, Tsun-Kong Sham and Xueliang Sun

Article (2019)

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Department: Department of Chemical Engineering
PolyPublie URL: https://publications.polymtl.ca/41861/
Journal Title: Canadian Journal of Chemical Engineering (vol. 97, no. 8)
Publisher: Wiley
DOI: 10.1002/cjce.23430
Official URL: https://doi.org/10.1002/cjce.23430
Date Deposited: 18 Apr 2023 15:02
Last Modified: 08 Apr 2025 07:06
Cite in APA 7: Norouzi Banis, M., Wang, Z., Rousselot, S., Liu, Y., Hu, Y., Talebi-Esfandarani, M., Bibienne, T., Gauthier, M., Li, R., Liang, G., Dollé, M., Sauriol, P., Sham, T.-K., & Sun, X. (2019). Chemical Speciation and Mapping of the Si in Si Doped LFP Ingot with Synchrotron Radiation Technique. Canadian Journal of Chemical Engineering, 97(8), 2211-2217. https://doi.org/10.1002/cjce.23430

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