Gerard T. Barkema, Normand Mousseau, Richard L. C. Vink and Partha Biswas
Paper (2001)
Document published while its authors were not affiliated with Polytechnique Montréal
An external link is available for this itemAdditional Information: | Article A28.1 |
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PolyPublie URL: | https://publications.polymtl.ca/41540/ |
Conference Title: | Symposium A: Amorphous and Heterogeneous Silicon-Based Films |
Conference Location: | San Francisco, Calif. |
Conference Date(s): | 2001-04-16 - 2001-04-20 |
Editors: | James B. Joyce, J. David Cohen, Jun-ichi Hanna, Robert W. Collins and Martin Stutzman |
Publisher: | Proceedings of the Materials Research Society |
DOI: | 10.1557/proc-664-a28.1 |
Official URL: | https://doi.org/10.1557/proc-664-a28.1 |
Date Deposited: | 18 Apr 2023 15:21 |
Last Modified: | 08 Apr 2025 07:05 |
Cite in APA 7: | Barkema, G. T., Mousseau, N., Vink, R. L. C., & Biswas, P. (2001, April). Basic mechanisms of structural relaxation and diffusion in amorphous silicon [Paper]. Symposium A: Amorphous and Heterogeneous Silicon-Based Films, San Francisco, Calif. (11 pages). https://doi.org/10.1557/proc-664-a28.1 |
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