Highly durable electrochromic tungsten oxide thin films prepared by high rate bias-enhanced sputter deposition

F. Blanchard, B. Baloukas and Ludvik Martinu

Article (2018)

An external link is available for this item

Department:	Department of Engineering Physics
PolyPublie URL:	https://publications.polymtl.ca/40570/
Journal Title:	Applied Materials Today (vol. 12)
Publisher:	Elsevier
DOI:	10.1016/j.apmt.2018.05.001
Official URL:	https://doi.org/10.1016/j.apmt.2018.05.001
Date Deposited:	18 Apr 2023 15:02
Last Modified:	25 Sep 2024 16:26

Cite in APA 7:	Blanchard, F., Baloukas, B., & Martinu, L. (2018). Highly durable electrochromic tungsten oxide thin films prepared by high rate bias-enhanced sputter deposition. Applied Materials Today, 12, 235-243. https://doi.org/10.1016/j.apmt.2018.05.001
APA 7 (HTML)ASCII CitationAtomBibTeXDOIsDublin CoreEndNote (.ENW)MARC (ISO 2709/UTF-8) (.MRC)MARC (UTF-8) (.MRK8)MARC XMLMPEG-21 DIDLMultiline CSVOAI-ORE Resource Map (Atom Format)OPENAIREOpenURL ContextObjectOpenURL ContextObject in SpanRDF+N-TriplesRDF+N3RDF+XMLReferReference Manager (.RIS)Simple Metadata

Statistics

Repository Staff Only