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Charge storage in PECVD silicon oxynitride layers

R. Kressmann, H. Amjadi, G. M. Sessler, D. Rats, Ludvik Martinu, Jolanta-Ewa Sapieha and Michael R. Wertheimer

Paper (1998)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/38271/
Conference Title: Annual Report Conference on Electrical Insulation and Dielectric Phenomena
Conference Location: Atlanta, GA, USA
Conference Date(s): 1998-10-25 - 1998-10-28
Publisher: IEEE
DOI: 10.1109/ceidp.1998.732970
Official URL: https://doi.org/10.1109/ceidp.1998.732970
Date Deposited: 18 Apr 2023 15:23
Last Modified: 05 Apr 2024 11:32
Cite in APA 7: Kressmann, R., Amjadi, H., Sessler, G. M., Rats, D., Martinu, L., Sapieha, J.-E., & Wertheimer, M. R. (1998, October). Charge storage in PECVD silicon oxynitride layers [Paper]. Annual Report Conference on Electrical Insulation and Dielectric Phenomena, Atlanta, GA, USA. https://doi.org/10.1109/ceidp.1998.732970

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