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VUV Photodeposition of Thiol-Terminated Films: A Wavelength-Dependent Study

Evelyne Kasparek, Jason Robert Tavares, Michael R. Wertheimer, Pierre-Luc Girard-Lauriault

Article (2018)

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Abstract

Photoinitiated chemical vapor deposition (PICVD) has become attractive for selective and specific surface functionalization, because it relies on a single energy source, the photons, to carry out (photo-) chemistry. In the present wavelength (λ)-dependent study, thiol (SH)-terminated thin film deposits have been prepared from gas mixtures of acetylene (C2H2) and hydrogen sulfide (H2S) via PICVD using four different vacuum-ultraviolet (VUV) sources, namely, KrL (λpeak = 123.6 nm), XeL (λpeak = 147.0 nm), XeE (λpeak = 172.0 nm), and Hg (λ = 184.9 nm) lamps. Different λ influence the deposition kinetics and film composition, reflecting that photolytic reactions are governed by the gases' absorption coefficients, k(λ). Thiol concentrations, [SH], up to ∼7.7%, were obtained with the XeL source, the highest reported in the literature so far. Furthermore, all films showed islandlike surface morphology, regardless of λ.

Uncontrolled Keywords

Thiol-terminated films; wavelength-dependent deposition; vacuum ultraviolet; photopolymerization; surface morphology.

Subjects: 1800 Chemical engineering > 1800 Chemical engineering
2000 Materials science and technology > 2004 Polymers and coatings
3100 Physics > 3100 Physics
3400 Physical chemistry > 3406 Photochemistry and photophysics
Department: Department of Chemical Engineering
Department of Engineering Physics
Research Center: GCM - Thin Film Physics and Technology Research Group
Funders: McGill University (MEDA), Fonds de recherche du Québec en nature et technologies (FRQNT), Plasma-Québec, CRSNG / NSERC, Canadian Foundation for Innovation (CFI)
PolyPublie URL: https://publications.polymtl.ca/3687/
Journal Title: Langmuir (vol. 34, no. 41)
Publisher: ACS Publications
DOI: 10.1021/acs.langmuir.8b01691
Official URL: https://doi.org/10.1021/acs.langmuir.8b01691
Date Deposited: 03 Dec 2018 16:28
Last Modified: 15 Nov 2022 15:28
Cite in APA 7: Kasparek, E., Tavares, J. R., Wertheimer, M. R., & Girard-Lauriault, P.-L. (2018). VUV Photodeposition of Thiol-Terminated Films: A Wavelength-Dependent Study. Langmuir, 34(41), 12234-12243. https://doi.org/10.1021/acs.langmuir.8b01691

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