Evelyne Kasparek, Jason Robert Tavares, Michael R. Wertheimer and Pierre-Luc Girard-Lauriault
Article (2018)
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Accepted Version Terms of Use: All rights reserved. Download (1MB) |
Cite this document: | Kasparek, E., Tavares, J. R., Wertheimer, M. R. & Girard-Lauriault, P.-L. (2018). VUV Photodeposition of Thiol-Terminated Films: A Wavelength-Dependent Study. Langmuir, 34(41), p. 12234-12243. doi:10.1021/acs.langmuir.8b01691 |
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Abstract
Photoinitiated chemical vapor deposition (PICVD) has become attractive for selective and specific surface functionalization, because it relies on a single energy source, the photons, to carry out (photo-) chemistry. In the present wavelength (λ)-dependent study, thiol (SH)-terminated thin film deposits have been prepared from gas mixtures of acetylene (C2H2) and hydrogen sulfide (H2S) via PICVD using four different vacuum-ultraviolet (VUV) sources, namely, KrL (λpeak = 123.6 nm), XeL (λpeak = 147.0 nm), XeE (λpeak = 172.0 nm), and Hg (λ = 184.9 nm) lamps. Different λ influence the deposition kinetics and film composition, reflecting that photolytic reactions are governed by the gases’ absorption coefficients, k(λ). Thiol concentrations, [SH], up to ∼7.7%, were obtained with the XeL source, the highest reported in the literature so far. Furthermore, all films showed islandlike surface morphology, regardless of λ.
Uncontrolled Keywords
Thiol-terminated films; wavelength-dependent deposition; vacuum ultraviolet; photopolymerization; surface morphology.
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Subjects: |
1800 Génie chimique > 1800 Génie chimique 2000 Science et technologie des matériaux > 2004 Polymères et revêtements 3100 Physique > 3100 Physique 3400 Chimie physique > 3406 Photochimie et photophysique |
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Department: |
Département de génie chimique Département de génie physique |
Research Center: | GCM - Groupe de recherche en physique et technologie des couches minces |
Funders: | McGill University (MEDA), Fonds de recherche du Québec en nature et technologies (FRQNT), Plasma-Québec, CRSNG / NSERC, Canadian Foundation for Innovation (CFI) |
Date Deposited: | 03 Dec 2018 16:28 |
Last Modified: | 08 Apr 2021 10:43 |
PolyPublie URL: | https://publications.polymtl.ca/3687/ |
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Journal Title: | Langmuir (vol. 34, no. 41) |
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Publisher: | ACS Publications |
Official URL: | https://doi.org/10.1021/acs.langmuir.8b01691 |
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