Evelyne Kasparek, Jason Robert Tavares
, Michael R. Wertheimer, Pierre-Luc Girard-Lauriault
Article (2018)
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Abstract
Photoinitiated chemical vapor deposition (PICVD) has become attractive for selective and specific surface functionalization, because it relies on a single energy source, the photons, to carry out (photo-) chemistry. In the present wavelength (λ)-dependent study, thiol (SH)-terminated thin film deposits have been prepared from gas mixtures of acetylene (C2H2) and hydrogen sulfide (H2S) via PICVD using four different vacuum-ultraviolet (VUV) sources, namely, KrL (λpeak = 123.6 nm), XeL (λpeak = 147.0 nm), XeE (λpeak = 172.0 nm), and Hg (λ = 184.9 nm) lamps. Different λ influence the deposition kinetics and film composition, reflecting that photolytic reactions are governed by the gases' absorption coefficients, k(λ). Thiol concentrations, [SH], up to ∼7.7%, were obtained with the XeL source, the highest reported in the literature so far. Furthermore, all films showed islandlike surface morphology, regardless of λ.
Uncontrolled Keywords
Thiol-terminated films; wavelength-dependent deposition; vacuum ultraviolet; photopolymerization; surface morphology.
| Subjects: |
1800 Chemical engineering > 1800 Chemical engineering 2000 Materials science and technology > 2004 Polymers and coatings 3100 Physics > 3100 Physics 3400 Physical chemistry > 3406 Photochemistry and photophysics |
|---|---|
| Department: |
Department of Chemical Engineering Department of Engineering Physics |
| Research Center: | GCM - Thin Film Physics and Technology Research Group |
| Funders: | McGill University (MEDA), Fonds de recherche du Québec en nature et technologies (FRQNT), Plasma-Québec, CRSNG / NSERC, Canadian Foundation for Innovation (CFI) |
| PolyPublie URL: | https://publications.polymtl.ca/3687/ |
| Journal Title: | Langmuir (vol. 34, no. 41) |
| Publisher: | ACS Publications |
| DOI: | 10.1021/acs.langmuir.8b01691 |
| Official URL: | https://doi.org/10.1021/acs.langmuir.8b01691 |
| Date Deposited: | 03 Dec 2018 16:28 |
| Last Modified: | 15 Nov 2022 15:28 |
| Cite in APA 7: | Kasparek, E., Tavares, J. R., Wertheimer, M. R., & Girard-Lauriault, P.-L. (2018). VUV Photodeposition of Thiol-Terminated Films: A Wavelength-Dependent Study. Langmuir, 34(41), 12234-12243. https://doi.org/10.1021/acs.langmuir.8b01691 |
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