<  Back to the Polytechnique Montréal portal

Laser-induced chemical vapor deposition of hydrogenated amorphous silicon. I. Gas-phase process model

Michel Meunier, J. H. Flint, J. S. Haggerty and D. Adler

Article (1987)

An external link is available for this item
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/35790/
Journal Title: Journal of Applied Physics (vol. 62, no. 7)
Publisher: American Institute of Physics
DOI: 10.1063/1.339412
Official URL: https://doi.org/10.1063/1.339412
Date Deposited: 18 Apr 2023 15:26
Last Modified: 05 Apr 2024 11:28
Cite in APA 7: Meunier, M., Flint, J. H., Haggerty, J. S., & Adler, D. (1987). Laser-induced chemical vapor deposition of hydrogenated amorphous silicon. I. Gas-phase process model. Journal of Applied Physics, 62(7), 2812-2812. https://doi.org/10.1063/1.339412

Statistics

Dimensions

Repository Staff Only

View Item View Item