Laser-induced chemical vapor deposition of hydrogenated amorphous silicon. I. Gas-phase process model

Michel Meunier, John H. Flint, J. S. Haggerty and David Adler

Article (1987)

An external link is available for this item

Department:	Department of Engineering Physics
PolyPublie URL:	https://publications.polymtl.ca/35790/
Journal Title:	Journal of Applied Physics (vol. 62, no. 7)
Publisher:	American Institute of Physics
DOI:	10.1063/1.339412
Official URL:	https://doi.org/10.1063/1.339412
Date Deposited:	18 Apr 2023 15:26
Last Modified:	08 Apr 2025 06:57

Cite in APA 7:	Meunier, M., Flint, J. H., Haggerty, J. S., & Adler, D. (1987). Laser-induced chemical vapor deposition of hydrogenated amorphous silicon. I. Gas-phase process model. Journal of Applied Physics, 62(7), 2812-2812. https://doi.org/10.1063/1.339412
APA 7 (HTML)ASCII CitationAtomBibTeXDOIsDublin CoreEndNote (.ENW)MARC (ISO 2709/UTF-8) (.MRC)MARC (UTF-8) (.MRK8)MARC XMLMPEG-21 DIDLMultiline CSVOAI-ORE Resource Map (Atom Format)OPENAIREOpenURL ContextObjectOpenURL ContextObject in SpanRDF+N-TriplesRDF+N3RDF+XMLReferReference Manager (.RIS)Simple Metadata

Statistics

Repository Staff Only