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Diode laser induced chemical vapor deposition of WSiₓ on TiN from WF₆ and SiH₄

Patrick Desjardins, R. Izquierdo and Michel Meunier

Article (1993)

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Department: Department of Engineering Physics
Research Center: GCM - Thin Film Physics and Technology Research Group
PolyPublie URL: https://publications.polymtl.ca/35725/
Journal Title: Journal of Applied Physics (vol. 73, no. 10)
Publisher: American Institute of Physics
DOI: 10.1063/1.353749
Official URL: https://doi.org/10.1063/1.353749
Date Deposited: 18 Apr 2023 15:26
Last Modified: 05 Apr 2024 11:28
Cite in APA 7: Desjardins, P., Izquierdo, R., & Meunier, M. (1993). Diode laser induced chemical vapor deposition of WSiₓ on TiN from WF₆ and SiH₄. Journal of Applied Physics, 73(10), 5216-5216. https://doi.org/10.1063/1.353749

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