Wu Jiudong, Nicolas Émond, Ali Hendaoui, S. Delprat, Mohamed Chaker and Ke Wu
Paper (2015)
An external link is available for this item| Department: | Department of Electrical Engineering |
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| Research Center: | POLY-GRAMES - Advanced Research Centre in Microwaves and Space Electronics |
| ISBN: | 9781479964505 |
| PolyPublie URL: | https://publications.polymtl.ca/34113/ |
| Conference Title: | IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP 2015) |
| Conference Location: | Suzhou, China |
| Conference Date(s): | 2015-07-01 - 2015-07-03 |
| Publisher: | IEEE |
| DOI: | 10.1109/imws-amp.2015.7324909 |
| Official URL: | https://doi.org/10.1109/imws-amp.2015.7324909 |
| Date Deposited: | 18 Apr 2023 15:07 |
| Last Modified: | 08 Apr 2025 12:21 |
| Cite in APA 7: | Jiudong, W., Émond, N., Hendaoui, A., Delprat, S., Chaker, M., & Wu, K. (2015, July). Broadband temperature-dependent dielectric properties of polycrystalline vanadium dioxide thin films [Paper]. IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP 2015), Suzhou, China. https://doi.org/10.1109/imws-amp.2015.7324909 |
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