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Laser-Induced Metal-Organic Chemical Vapor Deposition (MOCVD) of Cu(hfac)(TMVS) on Amorphous Teflon AF1600: an XPS Study of the Interface

D. Popovici, G. Czeremuzkin, Michel Meunier and Edward Sacher

Article (1998)

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Additional Information: Nom historique du département: Département de génie physique et de génie des matériaux
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/29407/
Journal Title: Applied Surface Science (vol. 126, no. 3-4)
Publisher: Elsevier
DOI: 10.1016/s0169-4332(98)00009-9
Official URL: https://doi.org/10.1016/s0169-4332%2898%2900009-9
Date Deposited: 18 Apr 2023 15:23
Last Modified: 05 Apr 2024 11:18
Cite in APA 7: Popovici, D., Czeremuzkin, G., Meunier, M., & Sacher, E. (1998). Laser-Induced Metal-Organic Chemical Vapor Deposition (MOCVD) of Cu(hfac)(TMVS) on Amorphous Teflon AF1600: an XPS Study of the Interface. Applied Surface Science, 126(3-4), 198-204. https://doi.org/10.1016/s0169-4332%2898%2900009-9

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