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Photodegradation of Teflon AF1600 During XPS Analysis

D. Popovici, Edward Sacher and Michel Meunier

Article (1998)

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Additional Information: Nom historique du département: Département de génie physique et de génie des matériaux
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/29403/
Journal Title: Journal of Applied Polymer Science (vol. 70, no. 6)
Publisher: Wiley
DOI: 10.1002/(sici)1097-4628(19981107)70:6<1201::aid-app17>3.0.co;2-1
Official URL: https://doi.org/10.1002/%28sici%291097-4628%281998...
Date Deposited: 18 Apr 2023 15:23
Last Modified: 05 Apr 2024 11:18
Cite in APA 7: Popovici, D., Sacher, E., & Meunier, M. (1998). Photodegradation of Teflon AF1600 During XPS Analysis. Journal of Applied Polymer Science, 70(6), 1201-1207. https://doi.org/10.1002/%28sici%291097-4628%2819981107%2970%3a6%3c1201%3a%3aaid-app17%3e3.0.co%3b2-1

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