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Reactive magnetron sputtering of CNₓ films : Ion bombardment effects and process characterization using optical emission spectroscopy

Jaroslav Vlcek, Karel Rusnak, Vaclav Hajek and Ludvik Martinu

Article (1999)

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Additional Information: Nom historique du département: Département de génie physique et de génie des matériaux
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/28508/
Journal Title: Journal of Applied Physics (vol. 86, no. 7)
Publisher: American Institute of Physics
DOI: 10.1063/1.371273
Official URL: https://doi.org/10.1063/1.371273
Date Deposited: 18 Apr 2023 15:22
Last Modified: 05 Apr 2024 11:16
Cite in APA 7: Vlcek, J., Rusnak, K., Hajek, V., & Martinu, L. (1999). Reactive magnetron sputtering of CNₓ films : Ion bombardment effects and process characterization using optical emission spectroscopy. Journal of Applied Physics, 86(7), 3646-3654. https://doi.org/10.1063/1.371273

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