Reactive magnetron sputtering of CNₓ films : Ion bombardment effects and process characterization using optical emission spectroscopy

Jaroslav Vlcek, Karel Rusnak, Vaclav Hajek and Ludvik Martinu

Article (1999)

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Additional Information:	Nom historique du département: Département de génie physique et de génie des matériaux
Department:	Department of Engineering Physics
PolyPublie URL:	https://publications.polymtl.ca/28508/
Journal Title:	Journal of Applied Physics (vol. 86, no. 7)
Publisher:	American Institute of Physics
DOI:	10.1063/1.371273
Official URL:	https://doi.org/10.1063/1.371273
Date Deposited:	18 Apr 2023 15:22
Last Modified:	08 Apr 2025 02:18

Cite in APA 7:	Vlcek, J., Rusnak, K., Hajek, V., & Martinu, L. (1999). Reactive magnetron sputtering of CNₓ films : Ion bombardment effects and process characterization using optical emission spectroscopy. Journal of Applied Physics, 86(7), 3646-3654. https://doi.org/10.1063/1.371273
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