A. Rubinshtein, R. Shneck, A. Raveh, Jolanta-Ewa Sapieha
and Ludvik Martinu
Article (2000)
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| Additional Information: | Nom historique du département: Département de génie physique et de génie des matériaux |
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| Department: | Department of Engineering Physics |
| PolyPublie URL: | https://publications.polymtl.ca/27867/ |
| Journal Title: | Journal of vacuum science and technology. A, Vacuum, surfaces, and films (vol. 18, no. 4) |
| Publisher: | American Vacuum Society |
| DOI: | 10.1116/1.582465 |
| Official URL: | https://doi.org/10.1116/1.582465 |
| Date Deposited: | 18 Apr 2023 15:22 |
| Last Modified: | 25 Sep 2024 16:08 |
| Cite in APA 7: | Rubinshtein, A., Shneck, R., Raveh, A., Sapieha, J.-E., & Martinu, L. (2000). Carburizing of Tantalum by Radio-Frequency Plasma Assisted Chemical Vapor Deposition. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 18(4), 2017-2022. https://doi.org/10.1116/1.582465 |
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