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Carburizing of Tantalum by Radio-Frequency Plasma Assisted Chemical Vapor Deposition

A. Rubinshtein, R. Shneck, A. Raveh, Jolanta-Ewa Sapieha and Ludvik Martinu

Article (2000)

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Additional Information: Nom historique du département: Département de génie physique et de génie des matériaux
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/27867/
Journal Title: Journal of vacuum science and technology. A, Vacuum, surfaces, and films (vol. 18, no. 4)
Publisher: American Vacuum Society
DOI: 10.1116/1.582465
Official URL: https://doi.org/10.1116/1.582465
Date Deposited: 18 Apr 2023 15:22
Last Modified: 05 Apr 2024 11:15
Cite in APA 7: Rubinshtein, A., Shneck, R., Raveh, A., Sapieha, J.-E., & Martinu, L. (2000). Carburizing of Tantalum by Radio-Frequency Plasma Assisted Chemical Vapor Deposition. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 18(4), 2017-2022. https://doi.org/10.1116/1.582465

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