A. Raveh, A. Danon, J. Hayon, A. Rubinshtein, R. Shneck, Jolanta-Ewa Sapieha and Ludvik Martinu
Article (2001)
An external link is available for this itemAdditional Information: | Nom historique du département: Département de génie physique et de génie des matériaux |
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Department: | Department of Engineering Physics |
PolyPublie URL: | https://publications.polymtl.ca/27108/ |
Journal Title: | Thin Solid Films (vol. 392, no. 1) |
Publisher: | Elsevier |
DOI: | 10.1016/s0040-6090(01)01004-5 |
Official URL: | https://doi.org/10.1016/s0040-6090%2801%2901004-5 |
Date Deposited: | 18 Apr 2023 15:21 |
Last Modified: | 25 Sep 2024 16:07 |
Cite in APA 7: | Raveh, A., Danon, A., Hayon, J., Rubinshtein, A., Shneck, R., Sapieha, J.-E., & Martinu, L. (2001). Characterization of Carburized Tantalum Layers Prepared in Inductive Rf Plasma. Thin Solid Films, 392(1), 56-64. https://doi.org/10.1016/s0040-6090%2801%2901004-5 |
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