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Characterization of Carburized Tantalum Layers Prepared in Inductive Rf Plasma

A. Raveh, A. Danon, J. Hayon, A. Rubinshtein, R. Shneck, Jolanta-Ewa Sapieha and Ludvik Martinu

Article (2001)

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Additional Information: Nom historique du département: Département de génie physique et de génie des matériaux
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/27108/
Journal Title: Thin Solid Films (vol. 392, no. 1)
Publisher: Elsevier
DOI: 10.1016/s0040-6090(01)01004-5
Official URL: https://doi.org/10.1016/s0040-6090%2801%2901004-5
Date Deposited: 18 Apr 2023 15:21
Last Modified: 05 Apr 2024 11:14
Cite in APA 7: Raveh, A., Danon, A., Hayon, J., Rubinshtein, A., Shneck, R., Sapieha, J.-E., & Martinu, L. (2001). Characterization of Carburized Tantalum Layers Prepared in Inductive Rf Plasma. Thin Solid Films, 392(1), 56-64. https://doi.org/10.1016/s0040-6090%2801%2901004-5

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