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Effect of unintentionally introduced oxygen on the electron-cyclotron resonance chemical-vapor deposition of SiNₓ films

P. Cova, Rémo A. Masut, Olivier Grenier and Suzie Poulin

Article (2002)

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Department: Department of Engineering Physics
Research Center: GCM - Thin Film Physics and Technology Research Group
PolyPublie URL: https://publications.polymtl.ca/26715/
Journal Title: Journal of Applied Physics (vol. 92, no. 1)
Publisher: American Institute of Physics
DOI: 10.1063/1.1483902
Official URL: https://doi.org/10.1063/1.1483902
Date Deposited: 18 Apr 2023 15:20
Last Modified: 25 Sep 2024 16:07
Cite in APA 7: Cova, P., Masut, R. A., Grenier, O., & Poulin, S. (2002). Effect of unintentionally introduced oxygen on the electron-cyclotron resonance chemical-vapor deposition of SiNₓ films. Journal of Applied Physics, 92(1), 129-138. https://doi.org/10.1063/1.1483902

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